Journal of Medical Physics
 Home | Search | Ahead of print | Current Issue | Archives | Instructions | Subscription | Login  The official journal of AMPI, IOMP and AFOMP      
 Users online: 578  Home  EMail this page Print this page Decrease font size Default font size Increase font size 
Year : 1996  |  Volume : 21  |  Issue : 1  |  Page : 31-34

Optimisation Of Dose Distribution In Single Planar Iridium Inplants



Correspondence Address:
S Ramkumar


Login to access the Email id

Source of Support: None, Conflict of Interest: None


Rights and PermissionsRights and Permissions

Single planar 'interstitial implants aim to irradiate 10 mm thickness of tissue to uniform dose. Interstitial iridium implants are normally practised with the same linear activity throughout the implant. As a result, the peripheral regions of the implant get lesser dose contribution from the central wires. Out study with the Planning System for a 5 x 4 cm2 area of parallel implant geometry shows that the peripheral regions receive only 83% of the prescribed dose and the minimum treated thickness is 7.6 mm only. increasing either the activity or time weight to the peripheral wires by 25% enables the peripheral regions to receive a minimum of 92% of the prescribed dose and the minimum treated thickness increases to 8.80 mm. The removal time of peripheral wires with time weight option can be calculated manually by a simple formula.


[PDF]*
Print this article     Email this article
 Next article
 Previous article
 Table of Contents

 Similar in PUBMED
   Search Pubmed for
   Search in Google Scholar for
 Citation Manager
 Access Statistics
 Reader Comments
 Email Alert *
 Add to My List *
 * Requires registration (Free)
 

 Article Access Statistics
    Viewed739    
    Printed48    
    Emailed0    
    PDF Downloaded72    
    Comments [Add]    

Recommend this journal